Modification of the Si3N4 nanopore was investigated under electron beam (e-beam) irradiation using a scanning electron microscope (SEM) and the results show that all the pores with diameters ranging from 40-200 nm can be shrunk and reshaped. The shrinkage rate increases with the energy deposited in the membrane. By using the selected area scan tool in the SEM, different shapes of Si3N4 nanopores have been fabricated successfully based on localized e-beam-induced joule heat, with characteristic dimension smaller than 10 nm. A novel technique was proposed to shrink and shape the nanopore to a special structure controllably.
Revised: June 8, 2007 |
Published: April 16, 2007
Citation
Zhang W., Y. Wang, J. Li, J. Xue, J. Xue, H. Ji, and Q. Ouyang, et al. 2007.Controllable shrinking and shaping of silicon nitride nanopores under electron irradiation.Applied Physics Letters 90, no. 16:Art. No. 163102.PNNL-SA-54222.doi:10.1063/1.2723680