January 15, 2007
Journal Article

Behavior of Si and C atoms in ion amorphized SiC

Abstract

Single crystal 6H-SiC wafers were fully amorphized at room temperature or 200 K using 1.0 or 2.0 MeV Au+ ion irradiation. The thickness of the amorphized layers has been determined using Rutherford backscattering spectrometry under ion channeling conditions. Microstructures of the irradiated SiC have been examined using cross-sectional transmission electron microscopy. The depth profiles of both the Si and C atoms have been studied using both x-ray photoelectron spectroscopy (XPS) and time-of-flight energy elastic recoil detection analysis. Neither Si nor C in the amorphized SiC exhibits a significant mass transport by diffusion during the irradiation and subsequent storage at room temperature. There is no observable phase segregation of either Si or C in the amorphized SiC. Ar+ ion sputtering leads to modifications of the composition, structure and chemical bonding at the 6H-SiC surface. The Si-Si bonds at the sputtered surface (amorphized) do not appear, as suggested by the XPS; however, Raman backscattering data reveals the existence of the Si-Si bonds in the bulk amorphized SiC, in addition to the C-C and Si-C bonds that the XPS also identified.

Revised: April 7, 2011 | Published: January 15, 2007

Citation

Jiang W., Y. Zhang, M.H. Engelhard, W.J. Weber, G.J. Exarhos, J. Lian, and R.C. Ewing. 2007. Behavior of Si and C atoms in ion amorphized SiC. Journal of Applied Physics 101, no. 2:Art. No. 023524. PNNL-SA-50763. doi:10.1063/1.2431941