PNNL Fellow Wins Medard W. Welch Award
His research is dedicated to the development of experimental tools and expertise critical for controlled synthesis and characterization of complex oxides
Scott Chambers, a laboratory fellow and the technical group leader for the PNNL Oxide Epitaxy Group, has been awarded the Medard W. Welch Award from the American Vacuum Society (AVS). This is the premier professional award bestowed by AVS and is given to scientists who have accomplished outstanding theoretical and/or experimental research.
An internationally recognized leader in the field of complex oxide thin films and heterostructures, Chambers is being recognized for his seminal contributions to the field, including epitaxial film growth, characterization, and understanding of fundamental principles that govern crystallographic properties and atom distributions, heterogeneities, defect formation, and functional properties.
His research is dedicated to the development of experimental tools and expertise critical for controlled synthesis and characterization of complex oxides, and gaining deep understanding of structure-composition-function relationships. The result of his research has been an insightful set of publications that in some cases have countered the prevailing view of these material systems. His work has raised the research community’s awareness of the importance of non-idealities in these materials. For a glimpse into Chambers’ work, click here to read an interview with Nature Materials.
The Medard W. Welch Award was established in 1969 to commemorate the pioneering efforts of Welch in founding and supporting the AVS and includes an honorary lectureship at the AVS International Symposium.