Studies the interactions with XPS and UPS. Reports that the CH3OH saturation coverage was increased by increasing the number of defects created by electron-beam exposure or Ar+ ion bombardment and a smal percentage of defects were healed upon the saturation exposure.
Revised: September 6, 2019 |
Published: September 1, 1998
Citation
Wang L.Q., K.F. Ferris, J.P. Winokur, A.N. Shultz, D.R. Baer, and M.H. Engelhard. 1998.Interactions of Methanol with Stoichiometric and Defective TiO2(110) and (100) Surfaces.Journal of Vacuum Science and Technology A--Vacuum, Surfaces and Films 16, no. 5:3034-3040.PNNL-SA-29625.doi:10.1116/1.581456