PNNL

Mission:

The ORION NanoFab Helium/Neon Ion Microscope uses neon and helium ion beams to create delicate sub-10 nanometer structures that demand extremely high machining fidelity. Whether an application requires material removal using sputtering, gas induced etching, deposition, or lithography, the HeIM excels in sub-10 nm fabrication.

Features:

• Imaging resolution of 0.5 nm allows for high resolution images of samples in the same instrument used for fabrication. The result is new insights with images 5-10 times greater depth of field when compared to images acquired with field emission scanning electron microscopes.