SAFE AND LOW TEMPERATURE THERMITE REACTION SYSTEMS AND METHOD TO FORM POROUS SILICON

Patent ID: 9184 | Patent Number 10,246,337 | Status: Granted

Abstract

Embodiments of a safe, low-temperature reaction system and method for preparing porous silicon are disclosed. The porous silicon is prepared from porous silica, a low-melting metal halide, and a metal comprising aluminum, magnesium, or a combination thereof. Advantageously, embodiments of the disclosed methods can be performed at temperatures 400° C. Silicon produced by the disclosed methods has a porosity that is equal to or greater than the porous silica precursor. The porous silicon is suitable for use in electrodes.

Application Number

15/436,027

Inventors

Li,Xiaolin
Zhang,Jason
Liu,Jun

Market Sector

Energy Storage