Ion implantation system and process for ultrasensitive determination of target isotopes

Patent ID: 8616 | Patent Number 9,443,708 | Status: Granted

Abstract

A system and process are disclosed for ultrasensitive determination of target isotopes of analytical interest in a sample. Target isotopes may be implanted in an implant area on a high-purity substrate to pre-concentrate the target isotopes free of contaminants. A known quantity of a tracer isotope may also be implanted. Target isotopes and tracer isotopes may be determined in a mass spectrometer. The present invention provides ultrasensitive determination of target isotopes in the sample.

Application Number

14/482,332

Inventors

Farmer III,Orville T
Liezers,Martin

Market Sector

Analytical Instruments