January 3, 2007
Journal Article

Synthesis and characterization of inorganic silicon oxycarbide glass thin films by reactive rf-magnetron sputtering

Abstract

Silicon oxycarbide glasses have been of interest because of the potential range of properties they might exhibit through a change in carbon-to-oxygen ratio. They are metastable materials and, as such, their structures and properties are very dependent upon the synthesis method. Silicon oxycarbide bonding has been seen in materials made by melting, oxidation, polycarbosilane or sol/gel pyrolysis, and chemical vapor deposition. In this work, the radio-frequency reactive sputtering of silicon carbide targets was explored for synthesis of amorphous silicon oxycarbide thin films. SiO (2-2x) Cx films, with a continuous range of compositions where 0

Revised: February 10, 2012 | Published: January 3, 2007

Citation

Ryan J.V., and C.G. Pantano. 2007. Synthesis and characterization of inorganic silicon oxycarbide glass thin films by reactive rf-magnetron sputtering. Journal of Vacuum Science & Technology A: International Journal Devoted to Vacuum, Surfaces, and Films 25, no. 1:153-159. PNNL-SA-85374. doi:10.1116/1.2404688