December 1, 2011
Journal Article

Transition from Irradiation-Induced Amorphization to Crystallization in Nanocrystalline Silicon Carbide

Abstract

Response to irradiation of nanocrystalline 3C-SiC is studied using 2 MeV Au+ ions near the critical temperature for amorphization and is compared to the behavior of its monocrystalline counterpart under the identical irradiation conditions. The irradiated samples have been characterized using in-situ ion channeling, ex-situ x-ray diffraction, and helium ion microscopy. Compared to monocrystalline 3C-SiC, a faster amorphization process in the nanocrystalline material (average grain size = 3.3 nm) is observed at 500 K. However, the nanograin grows with increasing ion fluence at 550 K and the grain size tends to saturate at high fluences. The striking contrast demonstrates a sharp transition from irradiation-induced interface-driven amorphization at 500 K to crystallization at 550 K. The results could show potential impacts of nanocrystalline SiC on nuclear fuel cladding and structural components of next-generation nuclear energy systems.

Revised: July 25, 2020 | Published: December 1, 2011

Citation

Jiang W., L. Jiao, and H. Wang. 2011. Transition from Irradiation-Induced Amorphization to Crystallization in Nanocrystalline Silicon Carbide. Journal of the American Ceramic Society 94, no. 12:4127–4130. PNNL-SA-82117. doi:10.1111/j.1551-2916.2011.04887.x