PNNL

Abstract

The ability of hydrogen to facilitate many types of heterogeneous catalysis starts with its adsorption. As such, understanding the temperature-dependence sticking of H2 is critical toward controlling and optimizing catalytic conditions in those cases where adsorption is rate-limiting. In this work, we examine the temperature-dependent sticking of H2/D2 to the clean RuO2(110) surface using the King & Wells molecular beam approach, temperature programmed desorption (TPD) and scanning tunneling microscopy (STM). We show that the sticking probability (molecular or dissociative) of H2/D2 on this surface is highly temperature-dependent, decreasing from ~0.4-0.5 below 25 K to effectively zero above 200 K. Both STM and TPD reveal that OH/OD formation is severely limited for adsorption temperatures above ~150 K. Previous literature reports of extensive surface hydroxylation from H2/D2 exposures at room temperature were most likely the result of inadvertent contamination brought about from dosing by chamber backfilling.