Site-specific Formation of Nanoporous Silicon on Micro-fabricated Silicon Surfaces

November 1, 2005

Conference Paper

Site-specific Formation of Nanoporous Silicon on Micro-fabricated Silicon Surfaces

Abstract

We demonstrated an ability to control the location of the porous silicon formation during electro-chemical etching by the introduction of micro- fabricated defects. This ability may open new doors for chemical and biological applications of porous silicon. In this paper, we have focused on the experimental procedure used to form this site-specific porous silicon area on micro- fabricated silicon surface. We also compared our results with work carried out by Saraf et al[1] during the early stage of porous silicon formation in conventional electrochemical etching.

Revised: March 25, 2011 | Published: November 1, 2005

Citation

Ou F.S., L.V. Saraf, and D.R. Baer. 2005. Site-specific Formation of Nanoporous Silicon on Micro-fabricated Silicon Surfaces. In Materials Research Society Symposium Proceedings: Symposium on Progress in Compound Semiconductor Materials IV, November 29 - December 3, 2004, Boston, MA, 829, 455-459. Warrendale, Pennsylvania:Material Research Society. PNNL-SA-52334.