PNNL

Abstract

Order-disorder processes fundamentally determine the structure and properties of many important oxide systems for energy and computing applications. While these processes have been widely studied in the bulk, they are less well understood for nanostructured oxide interfaces in highly non-equilibrium conditions. These systems can now be effectively realized through a range of thin film deposition techniques and probed at high spatial and chemical resolution, leading to a greater focus on interface dynamics. Here we survey a selection of recent studies of order-disorder behavior at thin film oxide interfaces, with a particular emphasis on the emergence of order during synthesis and disorder in extreme irradiation environments. We summarize key trends and identify directions for future study in this growing research area.