PNNL

Abstract

Energetic ion beam irradiation is the basis of a wide plethora of powerful research- and fabrication-techniques for materials characterisation and processing on a nanometre scale. Ion implantation is increasingly employed to tailor materials to various optical, magnetic and electrical properties, focused ion beams can be used to machine away or deposit material on a scale of nanometres, and the scattering of energetic ions is a unique and quantitative tool for process development in high speed electronics and 3-D nanostructures with extreme aspect ratios for tissue engineering and nano-fluidics lab-on-a-chip may be machined using proton beams. This book is proposed to be a multi-author work with different chapters written by established scientists from around the world that have a deep knowledge in their respective fields. The goal is to produce a work that is of real use to practitioners, researchers and students across the whole cross-disciplinary span of nanoscience and technology. Frontline nanoscience and technology developments in bio-medicine, optical materials and high-speed electronics will be used as a signpost and anchor point to subsequent sections that move progressively from fundamentals of nanoscale ion-matter interactions and theoretical tools towards the practical applications for forming nanostructures by ion irradiation, nanoscale characterisation of ion-damage and the interactions between nanolayers and writing novel structures with high and low energy ion beams. It is to propose to organise the work in five sections: Part I Trends in nanoscience and technology Part II Interaction of ions with materials on a nanoscale Part III Ion beam characterisation of nanoscale materials Part IV Nanoscale materials processing with ion beams Part V Equipment and practice