February 1, 1998
Journal Article

Ion beam source for soft-landing deposition

Abstract

"Soft-landing" deposition of molecular ions on various surfaces is important in making exotic radicals, modeling electrochemical double layers, and studying aqueous ion interactions.

Revised: November 1, 2019 | Published: February 1, 1998

Citation

Biesecker J.P., G.B. Ellison, H. Wang, M.J. Iedema, A.A. Tsekouras, and J.P. Cowin. 1998. Ion beam source for soft-landing deposition. Review of Scientific Instruments 69, no. 2:485-495. PNNL-SA-29788. doi:10.1063/1.1148459