September 8, 2009
Journal Article

Ion-beam-induced chemical disorder in GaN

Abstract

Atomistic structures of high-energy ion irradiated GaN have been examined using transmission electron microscopy (TEM). Single crystalline GaN substrates were irradiated at cryogenic temperature with 2 MeV Au2+ ions to a fluence of 7.35x1015 Au/cm2. Cross-sectional TEM observations revealed that damaged layers consisting of amorphous and nanocrystalline phases are formed at the surface and buried depth of the as-irradiated GaN substrate. Atomic radial distribution functions of the amorphous/poly-nanocrystalline regions showed that not only heteronuclear Ga-N bonds but also homonuclear Ga-Ga bonds exist within the first coordination shell. It was found that the ratio of heteronuclear-to-homonuclear bonds, i.e., the degree of chemical disorder is different between the surface and buried damaged layers. The alternation of chemical disorder was attributed to the difference in the defect formation processes between these layers.

Revised: September 14, 2010 | Published: September 8, 2009

Citation

Ishimaru M., Y. Zhang, and W.J. Weber. 2009. Ion-beam-induced chemical disorder in GaN. Journal of Applied Physics 106, no. 5:053513, 1-4. PNNL-SA-67175. doi:10.1063/1.3212555