We have investigated inteface reactions between expitaxilly-grown magnetite (Fe3O4) and maghemite (gamma-Fe2O3) films with MgO substrates using Rutherford backscattering (RBS), channeling, and x-ray diffraction(XRD). Annealing these films in 2.0x10 -6 Torr of oxygen at temperatures up to 970 K enhances Mg outdiffusion into the films and increases the film thickness depending on temperature. The magnetite film thickness reach a limiting value at 870 K anneal while the maghemite film thickness did not maximize after annealing at 970 K. After the annealing at 970 K, both films produced a compound with composition close to magnesioferrite (MgFe2O4). XRD results reveal the formatioin of magnesioferrite (MgFe2O4) films after annealing both films at 970 in oxygen.
Revised: November 10, 2005 |
Published: March 1, 2000
Citation
Thevuthasan S., D.E. McCready, W. Jiang, S.I. Yi, S. Maheswaran, K.D. Keefer, and S.A. Chambers. 2000.Ion Beam Analysis of Interface Reactions in Magnetite and Maghemite Thin Films.Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms 161-163.PNNL-SA-32359.