December 2, 2002
Journal Article

Investigation of Sputtered HfF4 Films and Application to Interference Filters for Thermophotovoltaics

Abstract

The optical properties of sputter deposited hafnium fluoride films and their use in fabricating a front surface, interference filter for thermophotovoltaic energy conversion (TPV) were investigated. In particular, HfF4 films were being considered for the low index component in a multilayer interference filter that will selectively transmit photons in the wavelength range of 1.0 micro m to 2.4 micro m, and strongly reflect all other wavelengths.

Revised: November 10, 2005 | Published: December 2, 2002

Citation

Martin P.M., L.C. Olsen, J.W. Johnston, and D.M. Depoy. 2002. Investigation of Sputtered HfF4 Films and Application to Interference Filters for Thermophotovoltaics. Thin Solid Films 420. PNNL-SA-36064.