The optical properties of sputter deposited hafnium fluoride films and their use in fabricating a front surface, interference filter for thermophotovoltaic energy conversion (TPV) were investigated. In particular, HfF4 films were being considered for the low index component in a multilayer interference filter that will selectively transmit photons in the wavelength range of 1.0 micro m to 2.4 micro m, and strongly reflect all other wavelengths.
Revised: November 10, 2005 |
Published: December 2, 2002
Citation
Martin P.M., L.C. Olsen, J.W. Johnston, and D.M. Depoy. 2002.Investigation of Sputtered HfF4 Films and Application to Interference Filters for Thermophotovoltaics.Thin Solid Films 420.PNNL-SA-36064.