Dielectric response of mesoporous silica films was monitored as a function of several gas-phase chemical species. The effects of humidity, ammonia and methane on dielectric constant and dissipation factor of films subjected to different chemical treatments are described. Dielectric constant and dissipation factor of partially dehydroxylated films were found to be highly sensitive to both water vapor and ammonia in air. The capacitive devices based on mesoporous silica films show potential for use in chemical sensors.
Revised: October 18, 2001 |
Published: October 1, 2001
Citation
Domansky K., J. Liu, L.Q. Wang, M.H. Engelhard, and S. Baskaran. 2001.Chemical Sensors Based on Dielectric Response of Functionalized Mesoporous Silica Films.Journal of Materials Research 16, no. 10:2810-2816.PNNL-SA-32961.