December 22, 2005
Journal Article

Chemical Bonding in Si52- and NaSi5- via Photoelectron Spectroscopy and Ab Initio Calculations

Abstract

Photoelectron spectroscopy and ab initio calculations are used to investigate the electronic structure and chemical bonding of Si5 - and Si5 2- in NaSi5 -. Photoelectron spectra of Si5 - and NaSi5 - are obtained at several photon energies and are compared with theoretical calculations at four different levels of theory, TD-B3LYP, R(U)OVGF, UCCSD(T), and EOM-CCSD(T), all with 6-311+G(2df) basis sets. Excellent agreement is observed between experiment and theory, confirming the obtained ground-state structures for Si5 - and Si5 2-, which are both found to be trigonal bipyramid with D3h symmetry at several levels of theory. Chemical bonding in Si5, Si5 -, and Si5 2- is analyzed using NPA, molecular orbitals, ELF, and NICS indices. The bonding in Si5 2- is compared with that in the isoelectronic and isostructural B5H5 2- species, but they are found to differ due to the involvement of electron densities, which are supposed to be lone pairs in the skeletal bonding in Si5 2-.

Revised: March 2, 2006 | Published: December 22, 2005

Citation

Yu D., Z. Boldyrev, A.I. Boldyrev, X. Li, L. Cui, and L.S. Wang. 2005. Chemical Bonding in Si52- and NaSi5- via Photoelectron Spectroscopy and Ab Initio Calculations. Journal of Physical Chemistry A 109, no. 50:11385-11394. PNNL-SA-48097.