July 11, 2019
Journal Article

Charge Transfer and Built-in Electric Fields Between a Crystalline Oxide and Silicon

Abstract

We report charge transfer and built-in electric fields across the epitaxial SrNbxTi1-xO3-d / Si(001) interface. Electrical transport measurements indicate the formation of a hole gas in the Si and the presence of built-in fields. Hard x-ray photoelectron measurements reveal pronounced asymmetries in core-level spectra that arise from these built-in fields. Analysis of these asymmetries enables built-in fields to be spatially mapped across the heterojunction. The demonstration of tunable charge transfer, built-in fields, and the spatial mapping of the latter, lays the groundwork for the development of electrically coupled, functional heterojunctions.

Revised: July 14, 2020 | Published: July 11, 2019

Citation

Lim Z., N. Quackenbush, A. Penn, M. Chrysler, M.E. Bowden, Z. Zhu, and J. Ablett, et al. 2019. Charge Transfer and Built-in Electric Fields Between a Crystalline Oxide and Silicon. Physical Review Letters 123, no. 2:Article Number 026805. PNNL-SA-144010. doi:10.1103/PhysRevLett.123.026805