Room temperature Ba deposition on an oxygen terminated ?-Al2O3/NiAl(100) ultrathin film substrate under ultra high vacuum (UHV) conditions is studied using X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES) and temperature programmed desorption (TPD) techniques. In addition, Ba oxidation by the alumina substrate at 300 K
Revised: April 27, 2011 |
Published: May 19, 2006
Citation
Ozensoy E., C.H. Peden, and J. Szanyi. 2006.Ba Deposition and Oxidation on ?-Al2O3/NiAl(100) Ultrathin Films. Part I: Anaerobic Deposition Conditions.Journal of Physical Chemistry 110.PNNL-SA-48356.doi:10.1021/jp060668l